Inprentus Diffraction Gratings Showed High Efficiency & Precision as New SIX Beamline at the National Synchrotron Light Source II Sees “first light”
Online PR News – 09-May-2017 – Champaign, IL – The newly completed SIX beamline, a flagship experimental end-station at Brookhaven National Labs' cutting-edge NSLS-II synchrotron, turned on for the first time in February. They reported sharp imaging and high fluence of the X-ray light source, both properties made possible through the integration of an Inprentus blazed diffraction grating which was custom designed and manufactured for the SIX beamline.
Regarding this advancement, Joseph Dvorak, an Assistant Physicist in the Beamline Research and Development Section at Brookhaven National Laboratory, stated the following: "High quality gratings are essential to our technique of soft x-ray energy loss spectroscopy. Inprentus is supplying gratings for our advanced spectrometer at NSLS-II."
In little over a year, Inprentus has delivered 10 diffraction grating products to the synchrotron market and has attracted interest from a variety of customers from around the world. With its growing order backlog, and its close work with the synchrotron community, Inprentus is well positioned to help evolve the science and technology of synchrotron applications beyond the current standard.
"This first light result from NSLS-II unequivocally demonstrates the superior quality of the Inprentus blazed diffraction grating products we are producing with our innovative approach to grating manufacturing," said Dr. Peter Abbamonte, Inprentus' Founder. "This is a key commercial milestone for the company."
Inprentus designs, manufactures and sells X-ray and EUV diffraction gratings for synchrotron radiation facilities that are used for a variety of scientific and commercial applications by many Fortune 500 companies, academic institutions and government laboratories around the world. Inprentus was founded in June 2012 by University of Illinois Urbana-Champaign physics professor Peter Abbamonte to commercialize an innovative technology, which is a technique for carrying out nano-scale lithography via mechanical deformation of metallic surfaces. This technology is a general purpose approach to high-precision patterning of surfaces, and is particularly suited to x-ray and EUV diffractive optics in which features must be shaped with 0.1 degree angular precision and positioned with nanometer precision over distances of tens of centimeters.